Selective Electron Beam Erosion and Deposition of Materials

Electron beam ablation of materials

The channelspark, a low accelerating voltage, high current electron beam accelerator, has been used for ablation of materials applied to thin film deposition. The channelspark operates at accelerating voltages of 10 to 20 kV with ;1500 A beam currents. The electron beam ionizes a low-pressure gas fill ~10–20 mTorr Ar or N2) to compensate its own space charge, allowing ion focused transport. Abl...

Selective Deposition of Biocompatible Sol-Gel Materials

An aqueous sol-gel route has been developed for electrochemically controlled deposition onto micro and nanofabricated electrodes. TEOS and MeTEOS were hydrolyzed under acidic conditions, and alcohol products were removed by distillation. The resulting clear sol has a hydrolysis ratio between 40 and 45. Following hydrolysis, pH was raised to 5.0 with addition of potassium hydroxide. At room temp...

Focused electron beam induced deposition: A perspective

BACKGROUND Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is ...

High-vacuum versus ‘‘environmental’’ electron beam deposition

Electron beam deposition ~EBD! provides an inexpensive way to fabricate nanostructures of various materials in a scanning electron microscope ~SEM!. However, the purity of metals deposited from an organometallic precursor gas is impaired by simultaneously deposited carbon coming both from the organometallic molecule and the residual contamination gas in the SEM chamber. We discuss carbon-contam...

Erosion and Deposition